Plasma etching device "EXAM" sample testing now accepting applications.
A compact batch-type plasma etching device that supports sub-micron etching and features process support through sample testing.
Supports etching of submicron Si oxide films in batch type. Compatible not only with SiN and Si-based thin films but also with high melting point metals and difficult-to-etch materials. Ideal for processing niche devices such as vertical etching of quartz and fine processing of thick photoresist. Actively supports a wide range of applications from ashing to cleaning through a multi-step process enabled by plasma mode switching.
- Company:神港精機 東京支店
- Price:Other